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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">plasticnews</journal-id><journal-title-group><journal-title xml:lang="ru">Пластические массы</journal-title><trans-title-group xml:lang="en"><trans-title>Plasticheskie massy</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">0554-2901</issn><publisher><publisher-name>PLASTMASSY Publishing House (Moscow)</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.35164/0554-2901-2023-5-6-17-21</article-id><article-id custom-type="elpub" pub-id-type="custom">plasticnews-880</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ЮБИЛЕЙ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ANNIVERSARY</subject></subj-group></article-categories><title-group><article-title>Материалы, применяемые в фотополимеризующихся композициях для трёхмерной печати. Их особенности и механизмы взаимодействия</article-title><trans-title-group xml:lang="en"><trans-title>Materials used in photopolymerizable compositions for 3D printing. Their features and interaction mechanisms</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Муравский</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Muravsky</surname><given-names>A. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>г. Санкт-Петербург</p></bio><bio xml:lang="en"><p>Saint-Petersburg</p></bio><email xlink:type="simple">a.muravskij@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Нефедова</surname><given-names>Ю. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Nefedova</surname><given-names>Yu. B.</given-names></name></name-alternatives><bio xml:lang="ru"><p>г. Санкт-Петербург</p></bio><bio xml:lang="en"><p>Saint-Petersburg</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Дворко</surname><given-names>И. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Dvorko</surname><given-names>I. M.</given-names></name></name-alternatives><bio xml:lang="ru"><p>г. Санкт-Петербург</p></bio><bio xml:lang="en"><p>Saint-Petersburg</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Панфилов</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Panfilov</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>г. Санкт-Петербург</p></bio><bio xml:lang="en"><p>Saint-Petersburg</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Лавров</surname><given-names>Н. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Lavrov</surname><given-names>N. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>г. Санкт-Петербург</p></bio><bio xml:lang="en"><p>Saint-Petersburg</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Санкт-Петербургский государственный технологический институт (технический университет)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Saint-Petersburg State Institute of Technology (Technical University)</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>26</day><month>07</month><year>2023</year></pub-date><volume>1</volume><issue>5-6</issue><fpage>17</fpage><lpage>21</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Муравский А.А., Нефедова Ю.Б., Дворко И.М., Панфилов Д.А., Лавров Н.А., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Муравский А.А., Нефедова Ю.Б., Дворко И.М., Панфилов Д.А., Лавров Н.А.</copyright-holder><copyright-holder xml:lang="en">Muravsky A.A., Nefedova Y.B., Dvorko I.M., Panfilov D.A., Lavrov N.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.plastics-news.ru/jour/article/view/880">https://www.plastics-news.ru/jour/article/view/880</self-uri><abstract><p>Представлены два механизма фотоотверждения жидких систем для трёхмерной печати. Выделены их особенности и характерные классы соединений. Описаны основные элементы фотополимеризующейся композиции (ФПК) для каждой из них. Выявлены сильные и слабые стороны основных типов соединений для каждого базового компонента фотоотверждаемой системы.</p></abstract><trans-abstract xml:lang="en"><p>Two photocuring mechanisms for liquid systems for 3D printing are presented. Their features and characteristic classes of compounds are highlighted. The main elements of a photopolymerizable composition (FPC) for each of them are described. The strengths and weaknesses of the main types of compounds for each basic component of the photocurable system are revealed.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>фотополимеризующаяся композиция</kwd><kwd>фотоотверждение</kwd><kwd>свободно-радикальная фотополимеризация</kwd><kwd>катионная полимеризация</kwd><kwd>анионная фотополимеризация</kwd></kwd-group><kwd-group xml:lang="en"><kwd>photopolymerizable composition</kwd><kwd>photocuring</kwd><kwd>free-radical photopolymerization</kwd><kwd>cationic polymerization</kwd><kwd>anionic polymerization</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Бабкин О.Э. 3D макетирование: технологии, оборудование, материалы. – СПб.: СПбГУКиТ. 2013. – 97 с.</mixed-citation><mixed-citation xml:lang="en">Бабкин О.Э. 3D макетирование: технологии, оборудование, материалы. – СПб.: СПбГУКиТ. 2013. – 97 с.</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Mendes-Felipe C., Oliveira J., Etxebarria I., Vilas-Vilela J.L., Lanceros-Mendez S. 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